Systems for displaying images

ABSTRACT

A system for displaying images is provided. The system includes a touch sensor device including a transparent substrate having a sensing region and a non-sensing region adjacent to the sensing region. A sensing electrode pattern layer is on the transparent substrate in the sensing region. An inorganic dielectric material layer is on the transparent substrate. The inorganic dielectric material layer has a first portion in the non-sensing region and a second portion in the sensing region and partially covering the sensing electrode pattern layer. A method of forming a touch sensor device is also disclosed.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a Continuation of pending U.S. patent applicationSer. No. 13/615, 227 filed Sep. 13, 2012 and entitled “Systems fordisplaying images” which claims priority of Taiwan Patent ApplicationNo. 100139911, filed on Nov. 2, 2011, the entirety of which areincorporated by reference herein.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The disclosure relates to touch panel display technology, and inparticular to a light shielding/decorative film for a touch sensordevice.

2. Description of the Related Art

A touch sensor device is typically integrated with a flat panel displaydevice, such as a liquid crystal display (LCD), an active matrix organiclight-emitting display (AMOLED) or the like, to form a touch paneldisplay. Touch panel displays are typically used in electronic devices,such as portable personal computers, personal digital assistants (PDAs),electronic books, projectors, mobile phones, and the like. The touchpanel display is capable of conducting input functions by a finger, astylus, a pen, or the like and therefore has gained an increasing amountof attention and popularity.

Generally, a shielding layer (e.g., a black matrix (BM) layer) istypically disposed in the peripheral region (i.e., a non-sensing regionor a fan-out region) of a touch sensor device for light shielding ordecoration. Currently, conventional black or white photoresist materialsare used as the shielding layer. Moreover, the shielding layer aretypically formed by a wet process (e.g., a screen printing or spincoating process), such that the shielding layer has a sufficientthickness (e.g., more than 1 μm) which is capable of providing a goodlight shielding effect. A step height, however, may be formed betweenthe fan-out region and the sensing region due to the thick shieldinglayer, resulting in a mura defect between the fan-out region and thesensing region after depositing a transparent conductive layer forformation of sensing electrodes in subsequent processes, which reducesthe display quality.

Accordingly, there exists a need in the art for development of a novellight shielding/decorative film structure, capable of mitigating oreliminating the aforementioned problems.

BRIEF SUMMARY OF THE INVENTION

A detailed description is given in the following embodiments withreference to the accompanying drawings. Systems for displaying imagesare provided. An exemplary embodiment of a system for displaying imagescomprises a touch sensor device comprising a transparent substratehaving a sensing region and a non-sensing region adjacent to the sensingregion. A sensing electrode pattern layer is on the transparentsubstrate in the sensing region. An inorganic dielectric material layeris on the transparent substrate. The inorganic dielectric material layerhas a first portion in the non-sensing region and a second portion inthe sensing region and partially covering the sensing electrode patternlayer.

An exemplary embodiment of a method of forming a touch sensor devicecomprises providing a transparent substrate. The transparent substratehas a sensing region and a non-sensing region adjacent to the sensingregion. A sensing electrode pattern layer is formed on the transparentsubstrate in the sensing region. An inorganic dielectric material layeris formed on the transparent substrate, wherein the inorganic dielectricmaterial layer has a first portion in the non-sensing region and asecond portion in the sensing region and partially covering the sensingelectrode pattern layer.

BRIEF DESCRIPTION OF DRAWINGS

The disclosure can be more fully understood by reading the subsequentdetailed description and examples with references made to theaccompanying drawings, wherein:

FIGS. 1A to 1D are cross sections of an embodiment of a method offorming a system for displaying images including a touch sensor deviceaccording to the disclosure;

FIG. 2 is a plan view of a partial structure of a sensing region in thetouch sensor device shown in FIG. 1D;

FIGS. 3A to 3C are cross sections of another embodiment of a method offorming a system for displaying images including a touch sensor deviceaccording to the disclosure;

FIGS. 4A to 4D are cross sections of yet another embodiment of a methodof forming a system for displaying images including a touch sensordevice according to the disclosure; and

FIG. 5 schematically shows another embodiment of a system for displayingimages.

DETAILED DESCRIPTION OF INVENTION

The following description is of the best-contemplated mode of carryingout the disclosure. This description is provided for the purpose ofillustrating the general principles of the disclosure and should not betaken in a limiting sense. The scope of the disclosure is bestdetermined by reference to the appended claims.

Systems for displaying images are provided. Refer to FIGS. 1D and 2, inwhich FIG. 1D is a cross section of an embodiment of a system fordisplaying images including a touch sensor device 200 according to thedisclosure, and FIG. 2 is a plan view of a partial structure of asensing region in the touch sensor device 200 shown in FIG. 1D. In theembodiment, the touch sensor device 200 comprises a transparentsubstrate 100, a sensing electrode pattern layer 102, an inorganicdielectric material layer 104, a reflective layer 106 a, a wiring layer106 b and a protective layer 120. In one embodiment, the transparentsubstrate 100 may be comprised of glass to serves as a sensing glass ora cover glass. In another embodiment, the transparent substrate 100 maybe comprised of quartz, or other flexible or inflexible polymertransparent materials. In the embodiment, the transparent substrate 100has a sensing region 10 and a non-sensing region 20. Typically, thesensing region 10 is located at the central region of transparentsubstrate 100 and the non-sensing region 20 is adjacent to the sensingregion 10. In the embodiment, the non-sensing region 20 is located atthe peripheral region of the transparent substrate 100 and encircles thesensing region 10.

The sensing electrode pattern layer 102 is on the transparent substrate100 in the sensing region 10. The sensing electrode pattern layer 102may be a transparent conductive pattern layer comprised of, for example,indium tin oxide (ITO) or indium zinc oxide (IZO), and typicallycomprise two sets of sensing electrodes arranged in an array. In oneembodiment, the sensing electrode pattern layer 102 comprises a set offirst sensing electrodes and a set of second sensing electrodesspatially insulated from and interlaced with the set of first sensingelectrodes. Here, in order to simplify the diagram, only a pair of firstsensing electrodes 102 c and a pair of second electrodes 102 ainterlaced with the pair of first sensing electrodes 102 c is depicted,as shown in FIG. 2. Each first sensing electrode 102 c in the set offirst sensing electrodes is electrically connected to each other along afirst axial direction X by an electrically connecting portion 102 b.

The inorganic dielectric material layer 104 is disposed on thetransparent substrate 100 and corresponds to the sensing region 10 andthe non-sensing region 20. For example, the inorganic dielectricmaterial layer 104 has a first portion 104 a on the transparentsubstrate 100 in the non-sensing region 20, to serve as a first portionof a light shielding/decorative film. Moreover, the inorganic dielectricmaterial layer 104 has a second portion 104 b on the transparentsubstrate 100 in the sensing region 10 and partially covering thesensing electrode pattern layer 102. For example, the second portion 104b of the inorganic dielectric material layer 104 covers the electricallyconnecting portion 102 b of the sensing electrode pattern layer 102along a second axial direction Y, as shown in FIG. 2.

The inorganic dielectric material layer 104 may have a thickness lessthan 0.3 μm. Moreover, in one embodiment, the inorganic dielectricmaterial layer 104 may be a single layer and be comprised of siliconoxide, silicon nitride or other transparent inorganic polymer.Additionally, the inorganic dielectric material layer 104 may be amulti-layer structure (e.g., a stack of silicon oxide layers, siliconnitride layers or other transparent inorganic polymer layers or acombination thereof). In the embodiment, the thickness of the firstportion 104 a of the inorganic dielectric material layer 104 (i.e., thelight shielding/decorative film) may be varied, such that the filmappears various colors due to the light interference principle.

The reflective layer 106 a is disposed on the transparent substrate 100in the non-sensing region 20 to cover the first portion 104 a of theinorganic dielectric material layer 104 and serves as a second portionof the decorative film. Moreover, the reflective layer 106 a is furtherextended to the sensing electrode pattern layer 102 to form traces andpads for electrical connections to the sensing electrode pattern layer102. In one embodiment, the reflective layer 106 a may be a single layer(e.g., aluminum, chromium, tin, zirconium, or an alloy thereof or acombination thereof) or a multi-layer structure (e.g., a stack ofaluminum layers, chromium layers, tin layers, zirconium layers, or alloylayers thereof or a combination thereof), such that the decorative filmfurther appears metal gloss.

The wiring layer 106 b is disposed on the second portion 104 b of theinorganic dielectric material layer 104. As shown in FIGS. 1D and 2,each second sensing electrode 102 a in the set of second sensingelectrodes is electrically connected to each other along the secondaxial direction Y by the wiring layer 106 b. The wiring layer 106 b maybe a single layer (e.g., aluminum, chromium, tin, zirconium, or an alloythereof or a combination thereof) or a multi-layer structure (e.g., astack of aluminum layers, chromium layers, tin layers, zirconium layers,or alloy layers thereof or a combination thereof). In one embodiment,the reflective layer 106 a and the wiring layer 106 b are formed of thesame metal layer.

The protective layer 120 is disposed on the transparent substrate 100 inthe sensing and non-sensing regions 10 and 20 and covers the reflectivelayer 106 a, the sensing electrode pattern layer 102 and the wiringlayer 106 b. In one embodiment, the protective layer 120 may becomprised of an inorganic dielectric material and may be a single layer(e.g., a silicon oxide, silicon nitride or silicon oxynitride layer) ora multi-layer structure (e.g., a stack of silicon oxide layers, siliconnitride layers, silicon oxynitride layers or a combination thereof). Inanother embodiment, the protective layer 120 may be comprised of anorganic photoresist material.

Refer to FIG. 3C, which is a cross section of another embodiment of asystem for displaying images including a touch sensor device 200according to the disclosure. Elements in FIG. 3C that are the same asthose in FIG. 1D are labeled with the same reference numbers as in FIG.1D and are not described again for brevity. Unlike the embodiment ofFIG. 1D, the touch sensor device 200 of the embodiment comprises anon-conductive reflective layer 105 a and a metal layer 105 b. Thenon-conductive reflective layer 105 a may be comprised of a dielectricmaterial with high reflectivity, such as ink (e.g., silver or whiteink), a discontinuous phase of metal or a photoresist (e.g., silver orwhite photoresist). Moreover, the metal layer 105 b is disposed on thenon-conductive reflective layer 105 a and extended to the sensingelectrode pattern layer 102 to form traces and pads for electricalconnections to the sensing electrode pattern layer 102. In oneembodiment, the metal layer 105 b and a wiring layer 105 c are formed ofthe same material layer and may be a single layer (e.g., aluminum,chromium, tin, zirconium, or an alloy thereof or a combination thereof)or a multi-layer structure (e.g., a stack of aluminum layers, chromiumlayers, tin layers, zirconium layers, or alloy layers thereof or acombination thereof). Each second sensing electrode 102 a in the set ofsecond sensing electrodes is also electrically connected to each otheralong the second axial direction Y by the wiring layer 105 c as well asthe wiring layer 106 b (shown in FIG. 2).

Refer to FIG. 4D, which is a cross section of yet another embodiment ofa system for displaying images including a touch sensor device 200according to the disclosure. Elements in FIG. 4D that are the same asthose in FIG. 1D or 3C are labeled with the same reference numbers as inFIG. 1D or 3C and are not described again for brevity. The touch sensordevice 200 of the embodiment, which is similar to that of the embodimentof FIG. 1D, may comprise a transparent substrate 100, a sensingelectrode pattern layer 102, an inorganic dielectric material layer 104and a protective layer 120. Moreover, the touch sensor device 200 of theembodiment may further comprise a first metal layer 107, a second metallayer 110 a, an isolation layer 108 and a wiring layer 110 b. The firstmetal layer 107 is disposed on the transparent substrate 100 in thenon-sensing region 20 to cover the first portion 104 a of the inorganicdielectric material 104 and serves as a reflective layer, wherein thefirst metal layer 107 may be comprised of the same material as that ofthe reflective layer 106 a shown in FIG. 1D. In one embodiment, thefirst metal layer 107 may be a single layer or a multi-layer structurethat is comprised of a non-conductive discontinuous phase of metal, suchas aluminum, chromium, tin, zirconium, or an alloy thereof or acombination thereof.

The second metal layer 110 a, which may be comprised of the samematerial as that of the metal layer 105 b shown in FIG. 3C, is disposedon the first metal layer 107 and extended to the sensing electrodepattern layer 102 to form traces and pads for electrical connections tothe sensing electrode pattern layer 102.

The isolation layer 108 is interposed between the first metal layer 107and the second metal layer 110 a and extended to the sidewalls of thefirst metal layer 107 and the underlying inorganic dielectric materiallayer 104, such that the first metal layer 107 is electrically insulatedfrom the second metal layer 110 a. In one embodiment, the isolationlayer 108 may be comprised of the same material as that of the inorganicdielectric material layer 104 or the protective layer 120.

The wiring layer 110 b is disposed on the second portion 104 b of theinorganic dielectric material layer 104, such that the protective layer120 covers the second metal layer 110 a, the sensing electrode patternlayer 102 and the wiring layer 110 b. Additionally, each second sensingelectrode 102 a in the set of second sensing electrodes is alsoelectrically connected to each other along the second axial direction Yby the wiring layer 110 b as well as the wiring layer 106 b (shown inFIG. 2). In one embodiment, the wiring layer 110 b and the second metallayer 110 a are formed of the same material layer.

FIGS. 1A to 1D are cross sections of an embodiment of a method offorming a system for displaying images including a touch sensor deviceaccording to the disclosure. Referring to FIG. 1A, a transparentsubstrate 100, which has a sensing region 10 and a non-sensing region 20adjacent thereto, is provided. Next, a sensing electrode pattern layer102, such as an ITO or IZO pattern layer, is formed on the transparentsubstrate 100. The sensing electrode pattern layer 102 comprises a setof first sensing electrodes, a set of second sensing electrodesspatially insulated from and interlaced with the set of first sensingelectrodes, and an electrically connecting portion 102 b. Here, in orderto simplify the diagram, only a pair of first sensing electrode 102 c(as shown in FIG. 2) and a pair of second sensing electrodes 102 a (asshown in FIGS. 1A and 2) spatially insulated from and interlaced withthe pair of first sensing electrode 102 c are depicted. Each firstsensing electrode 102 c in the set of first sensing electrodes iselectrically connected to each other along a first axial direction X bythe electrically connecting portion 102 b, as shown in FIG. 2.

Referring to FIG. 1B, an inorganic dielectric material layer 104 isformed on the transparent substrate 100 by a conventional depositionprocess, such as chemical vapor deposition (CVD) process. Thereafter,the inorganic dielectric material layer 104 is patterned by conventionallithography and etching processes, such that the inorganic dielectricmaterial layer 104 has a first portion 104 a on the transparentsubstrate 100 in the non-sensing region 20 and a second portion 104 b onthe transparent substrate 100 in the sensing region 10 and partiallycovering the sensing electrode pattern layer 102. The first portion 104a serves as a first portion of a light shielding/decorative film, andthe second portion 104 b covers the electrically connecting portion 102b of the sensing electrode pattern layer 102 along a second axialdirection Y, as shown in FIG. 2.

Referring to FIG. 1C, a conductive layer (not shown) is formed on thetransparent substrate 100 by a conventional deposition process (e.g.,CVD), to cover the inorganic dielectric material layer 104 and thesensing electrode pattern layer 102 shown in FIG. 1B. Thereafter, theconductive layer is patterned by conventional lithography and etchingprocesses, to form a reflective layer 106 a on the transparent substrate100 in the non-sensing region 20, thereby covering the first portion 104a of the inorganic dielectric material layer 104, and form a wiringlayer 106 b on the second portion 104 b of the inorganic dielectricmaterial layer 104 in the sensing region 10. The reflective layer 106 ais extended to the sensing electrode pattern layer 102 to form tracesand pads for electrical connections to the sensing electrode patternlayer 102. Moreover, the wiring layer 106 b is also extended to thesensing electrode pattern layer 102, such that the adjacent secondsensing electrodes 102 a in the set of second sensing electrodes areelectrically connected to each other along the second axial direction Yby the wiring layer 106 b, as shown in FIG. 2.

Referring to FIG. 1D, a protective layer 120 is formed on the structureshown in FIG. 1C by a conventional deposition process (e.g., CVD), tocover the reflective layer 106 a, the sensing electrode pattern layer102, and the wiring layer 106 b.

FIGS. 3A to 3C are cross sections of another embodiment of a method offorming a system for displaying images including a touch sensor deviceaccording to the disclosure. Elements in FIGS. 3A to 3C that are thesame as those in FIGS. 1A to 1D are labeled with the same referencenumbers as in FIGS. 1A to 1D and are not described again for brevity.Referring to FIG. 3A, a transparent substrate 100 having a sensingelectrode pattern layer 102 and an inorganic dielectric material layer104 thereon is provided, which is the same as the structure shown inFIG. 1B. Next, a non-conductive reflective layer 105 a, which is adielectric layer with high reflectivity, such as ink (e.g., silver orwhite ink), a discontinuous phase of metal or a photoresist (e.g.,silver or white photoresist), is formed on the first portion 104 a ofthe inorganic dielectric material layer 104.

Referring to FIG. 3B, a metal layer 105 b is formed on thenon-conductive reflective layer 105 a in the non-sensing region 20 byconventional deposition (e.g., CVD), lithography and etching processes,to enhance the reflective ability. At the same time, a wiring layer 105c is formed on the second portion 104 b of the inorganic dielectricmaterial layer 104 in the sensing region 10, and is extended to thesensing electrode pattern layer 102 through the sidewall of the secondportion 104 b of the inorganic dielectric material layer 104. The metallayer 105 b may be further extended to the sensing electrode patternlayer 102 through sidewalls of the non-conductive reflective layer 105 aand the underlying first portion 104 a of the inorganic dielectricmaterial layer 104.

Referring to FIG. 3C, a protective layer 120 is formed on the structureshown in FIG. 3B by a conventional deposition process (e.g., CVD), tocover the metal layer 105 b, the sensing electrode pattern layer 102 andthe wiring layer 105 c.

FIGS. 4A to 4D are cross sections of yet another embodiment of a methodof forming a system for displaying images including a touch sensordevice according to the disclosure. Elements in FIGS. FIGS. 4A to 4Dthat are the same as those in FIGS. 1A to 1D are labeled with the samereference numbers as in FIGS. 1A to 1D and are not described again forbrevity. Referring to FIG. 4A, a transparent substrate 100 having asensing electrode pattern layer 102 and an inorganic dielectric materiallayer 104 thereon is provided, which is the same as the structure shownin FIG. 1B. Next, a first metal layer 107 is formed on the transparentsubstrate 100 in the non-sensing region 20 by conventional deposition(e.g., CVD), lithography and etching processes, to cover the firstportion 104 a of the inorganic dielectric material layer 104 and serveas a reflective layer. In some embodiments, a non-conductivediscontinuous phase of metal layer is formed in the non-sensing region20 by non-conductive vacuum metallization (NCVM), to be instead of thefirst metal layer 107.

Referring to FIG. 4B, an isolation layer 108 is formed on the firstmetal layer 107 in the non-sensing region 20 by conventional deposition(e.g., CVD), lithography and etching processes. The isolation layer 108may be extended to the sensing electrode pattern layer 102 throughsidewalls of the first metal layer 107 and the underlying first portion104 a of the inorganic dielectric material layer 104.

Referring to FIG. 4C, a second metal layer 110 a is formed on theisolation layer 108 by conventional deposition (e.g., CVD), lithographyand etching processes. At the same time, a wiring layer 110 b is formedon the second portion 104 b of the inorganic dielectric material layer104 and extended to the sensing electrode pattern layer 102 through thesidewall of the second portion 104 b of the inorganic dielectricmaterial layer 104. The second metal layer 110 a may be further extendedto the sensing electrode pattern layer 102 through the sidewall of theisolation layer 108. In this case, the second metal layer 110 a iselectrically insulated from the first metal layer 107 by the isolationlayer 108.

Referring to FIG. 4D, a protective layer 120 is formed on the structureshown in FIG. 4C by a conventional deposition process (e.g., CVD), tocover the second metal layer 110 a, the sensing electrode pattern layer102, and the wiring layer 110 b.

According to the aforementioned embodiments, since the sensingelectrodes are formed prior to the formation of the lightshielding/decorative film, a step height is not formed between thenon-sensing region and the sensing region. Namely, mura defects can beeliminated, thereby increasing the display quality. Moreover, the lightshielding/decorative film can have desired colors by adjusting thethickness of the inorganic dielectric material layer in the lightshielding/decorative film and can appear metal gloss or enhance thereflective ability by the reflective layer. Accordingly, compared to theconventional light shielding/decorative film formed of photoresistmaterial, the light shielding/decorative film according to theembodiments can provide more color choices for users. Moreover, sincethe inorganic dielectric material layer, the reflective layer, and theprotective layer in the light shielding/decorative film can be formedduring fabrication of the components in the sensing region of the touchsensor device, the fabrication of the light shielding/decorative filmcan be easily integrated with the fabrication of the touch sensordevice, thereby simplifying processes.

FIG. 5 schematically shows another embodiment of a system for displayingimages which, in this case, is implemented as a touch panel display 300or an electronic device 500 such as a tablet personal computer, aprojector, an electronic book, a laptop computer, a mobile phone, adigital camera, a personal digital assistant (PDA), a desktop computer,a television, a car display or a portable DVD player. The describedtouch sensor device 200 can be incorporated into the touch panel display300. In some embodiments, the touch sensor device 200 can beincorporated into the electronic device 500. As shown in FIG. 5, theelectronic device 500 comprises the touch panel display 300 and an inputunit 400. Moreover, the input unit 400 is coupled to the touch paneldisplay 300 and is operative to provide input signals (e.g. imagesignals) to the touch panel display 300 to generate images.

While the disclosure has been described by way of example and in termsof preferred embodiment, it is to be understood that the disclosure isnot limited thereto. To the contrary, it is intended to cover variousmodifications and similar arrangements (as would be apparent to thoseskilled in the art). Therefore, the scope of the appended claims shouldbe accorded the broadest interpretation so as to encompass all suchmodifications and similar arrangements.

What is claimed is:
 1. A system for displaying images, comprising: atouch sensor device, comprising: a transparent substrate having asensing region and a non-sensing region adjacent to the sensing region;a sensing electrode pattern layer disposed on the transparent substratein the sensing region; an inorganic dielectric material layer disposedon the transparent substrate and having a first portion in thenon-sensing region and a second portion in the sensing region, and afirst metal layer disposed on the transparent substrate and contactingthe first portion of the inorganic dielectric material layer, whereinthe inorganic dielectric material layer is between the sensing electrodepattern layer and the first metal layer.
 2. The system of claim 1,wherein the sensing electrode pattern layer comprises: a set of firstsensing electrodes and a set of second sensing electrodes spatiallyinsulated from and interlaced with the set of first sensing electrodes;and an electrically connecting portion electrically connected to the setof first sensing electrodes along a first axial direction, wherein theinorganic dielectric material layer contacts the electrically connectingportion along a second axial direction.
 3. The system of claim 2,wherein the touch sensor device further comprises: a wiring layerdisposed on the second portion of the inorganic dielectric materiallayer and electrically connected to the set of second sensing electrodesalong the second axial direction.
 4. The system of claim 3, wherein thefirst metal layer is extended to the sensing electrode pattern layer andis formed of the same material layer with the wiring layer.
 5. Thesystem of claim 3, wherein the touch sensor device further comprises: asecond metal layer disposed on the transparent substrate in thenon-sensing region and contacting the first portion of the inorganicdielectric material layer; and an isolation layer contacting the secondmetal layer.
 6. The system of claim 3, wherein the touch sensor devicefurther comprises a protective layer overlapping the first metal layer,the sensing electrode pattern layer, and the wiring layer.
 7. The systemof claim 1, wherein the system further comprises a touch panel display,wherein the touch panel display comprises the touch sensor device. 8.The system of claim 7, further comprising an electronic device havingthe touch panel display, wherein the electronic device comprises atablet personal computer, a projector, an electronic book, a laptopcomputer, a mobile phone, a digital camera, a personal digitalassistant, a desktop computer, a television, a car display or a portableDVD player.